The Technology of Manufacturing Nanowires from Superconducting Niobium Nitride: Proximity Effect Correction Methods in Electron Lithography

Student: Angheliuc Diana

Faculty: HSE Tikhonov Moscow Institute of Electronics and Mathematics (MIEM HSE)

Educational Programme: Materials. Devices. Nanotechnology (Master)

Year of Graduation: 2019

The research work is devoted to the study of the possibilities and methods for correcting proximity effects in the process of manufacturing nanostructures from superconducting niobium nitride (NbN) using electronic lithography. The process of electronic lithography and its main problem – proximity effects, as well as methods for their correction are described in detail. The paper also describes the technology of manufacturing nanostructures from superconducting niobium nitride.

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